Company & Technology Introduction — we chart a clear path through the sea of complex problems.
-- measurement → physics -- → compute → AI → report haedosa :: Principle -> Computation -> AI -> Problem -> Solution haedosa p c ai challenge = solve
Semiconductor, display, and precision manufacturing need software that measures more accurately, inspects faster, and adapts to more product and process conditions. Haedosa unites physics simulation, HPC, industrial software, and industrial AI into one system — and accumulates each project's results as reusable numerical-AI capability.
HAEDOSAAn expert who analyzes complex problems and proposes the solution.
A master who leads technical direction with deep insight and experience.
A navigator who explores unknown technical territory and charts new routes.
In-house optical analysis & first-principles computation.
GPU acceleration & parallel processing for massive data.
High-precision software built for field deployment.
Classification, anomaly detection & virtual metrology.
HAEDOSAIn-house physics simulation for structure analysis, model fitting, and virtual training-data generation.
Multicore parallelism & GPU acceleration for large-scale simulation, inspection, and ML.
Specialized image, signal/spectrum, numerical-AI, and in-context learning on in-house engines.
Simulation + reference spectrum–structure pairs.
Raman + ellipsometry, multi-modal analysis.
Sensor signals linked to metrology references.
Image-based inspection & metrology.
Large-volume 3D signals.
National R&D · OCD 2023–27 · Raman-SE 2024–26Design, simulate, fit, generate data, train surrogates, and run Hybrid OCD inverse — one workbench on fmmdosa.
Label → train → evaluate → deploy. Context-based classification, SAM auto-labeling, diffusion anomaly detection.
GPU holotomography volume rendering with cylinder fitting, roughness, and crack-size analysis.
Reconstructs large-area surfaces from height-map tiles — overlap optimization, CPU/GPU parallel registration.
Large Numerical Model: structured tokens + autoregressive, in-context estimation before physical metrology.
High-speed wafer/panel inspection — holes, defects, cavities, bumps — streaming + ROI parallelism, SPC export.
HAEDOSA
GPU-accelerated RCWA/FMM — reflection/transmission, Ψ/Δ, Jones, Mueller, Stokes S0–S7 for spectrum libraries & AI training.

2nd-order GPU-accelerated High-Precision Learning — fast, accurate convergence on high-oscillation spectra and narrow responses.
OCD/SE engines, RCWA/FMM analysis, metrology SW, high-precision ML — in-house engine, Hybrid-OCD research.
Algorithm optimization, parallelization, CPU/GPU acceleration, takt-time improvement — drop-in modules.
AI-AOI classification, unsupervised anomaly detection, segmentation, factory-automation integration.
Holotomography rendering, automatic geometry analysis, TGV/hole/bump inspection software.
Tile registration, CPU/GPU parallel processing, accuracy validation — faster large-area reconstruction.
Spectrum analysis, wafer defect inspection, accumulated-data analysis & quality-judgment workflows.
A · T · K-Lab · national R&D · multiple industrial clients
From initial consulting to full implementation, we navigate the complexity with you — and leave you with sustainable, reproducible solutions.